Application Field
이온주입(Ion Implant)공정, 에슁(Ashing)공정, Epi공정, 화학증착(CVD)공정, HCl, HF, HBr, BCl3 등 산성가스 제거용
Characteristic
Appearance
Reaction Mechanism
| Gas | Mechanism | TLV (ppm) |
|---|---|---|
| BCl3 | BCl3 + 3MOH → 3MCl + B(OH)3 | 5 |
| BCl3 + 3MO(OH) → 3MOCl + B(OH) | ||
| HBr | 2HBr + M(OH)2 → MBr2+ 2H2O | 3 |
| HCl | 3HCl + MO(OH) →MCl3 + 2H2O | 5 |
| HF | 6HF + M2O3 → 2MF3 + 3H2O | 3 |
| SiH4 | SiH4 + 2MOH →M2Si + 2H2O + H2 | 5 |