Application Field
Diffusion Process, Chemical Vapor Deposition(CVD) Process, For reducing of Acid Gases, H2S, H2Se, PH3, AsH3, B2H6, etc.
Characteristic
Appearance
Reaction Mechanism
| Gas | Mechanism | TLV (ppm) |
|---|---|---|
| H2S | Cu(OH)2 + H2S → CuHS + 2H2O | 5 |
| 2Cu(OH)2 + H2S → Cu2S + 4H2O |