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Applications

  • Installed inside the H-Leg at the front end of a vacuum pump.
  • Condensation reactions, minimizing impacts by foreline drops, removal of large particles and chunks, etc.

Characteristic

  • Effective removal of relatively large or heavy particles and by-products
  • Easy maintenance & service
  • No conductance during usage

Specification

Category

Details

General

Model

TM

Material

SUS304

Size

160 Ø

Main Functions

· Maximum capturing capability of large or heavy particles by controls kinetic mobility of the powder drops, installed before the pump and maximize the powder reduction)

· Internal designs to maintain vacuum performance and conductance
(→ effective conductance design to maintain the vacuum performance)

Main Applications

Harsh processes in semiconductor manufacturing
(CVDs, DIFF, Etches, metal organic by-products, etc.)
Copyright HANSO INC. CEO : Sang Woong Kim Main Office/Research Institute: 149, Jukdong-ro, Youseong-gu, Daejeon, Republic of Korea, 34127   Factory: 18th-71, Munpyeongseo-ro, Daedeok-gu, Daejeon, Republic of Korea, 34302
Business Registration No : 314-81-36819 TEL : 82.42.936.0991 FAX : 82.42.936.0994 E-mail : info@hansoinc.com top